A change of etch rate associated with the amorphous to crystalline transition in CVD layers of silicon

✍ Scribed by B.A. Boxall

• Book ID: 107856294
• Publisher: Elsevier Science
• Year: 1977
• Tongue: English
• Weight: 112 KB
• Volume: 20
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(77)90177-0