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A case study of defects due to process marginalities in deep sub-micron technology

✍ Scribed by Hung-Sung Lin; Chun-Ming Chen; Kuo-Hsiung Chen; Afung Wang; CH Chao

Book ID: 108210744
Publisher: Elsevier Science
Year: 2007
Tongue: English
Weight: 974 KB
Volume: 47
Category: Article
ISSN: 0026-2714
DOI: 10.1016/j.microrel.2007.07.075

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