𝔖 Bobbio Scriptorium
✦   LIBER   ✦

A 20 K cryopump with a high conductance baffle design

✍ Scribed by OC Dermois; PW Schmidt


Book ID
104265152
Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
272 KB
Volume
30
Category
Article
ISSN
0042-207X

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Reliability of SiO2 and high-k gate insu
✍ M. Porti; L. Aguilera; X. Blasco; M. NafrΔ±Β΄a; X. Aymerich πŸ“‚ Article πŸ“… 2007 πŸ› Elsevier Science 🌐 English βš– 357 KB

In this work, a conductive atomic force microscope (C-AFM) is used to study the reliability (degradation and breakdown, BD) of SiO 2 and high-k dielectrics. The effect of a current limit on the post-BD SiO 2 electrical properties at the nanoscale is discussed. In particular, the impact of a current