A 150/300 kV equipment for ion implantation: M Setvak et al, Proc 5th Czech Conf Electron Vacuum Phys, Czech Acad Sci, Brno 1972, II a-19

• Publisher: Elsevier Science
• Year: 1974
• Tongue: English
• Weight: 163 KB
• Volume: 24
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(74)90194-8