✦ LIBER ✦
925. Controlled rf-sputter etching using atomic absorption spectroscopy: H J Bauer and E H Bogardus,J Vac Sci Technol, 11 (6), 1974, 1144–1147
- Book ID
- 103463622
- Publisher
- Elsevier Science
- Year
- 1975
- Tongue
- English
- Weight
- 178 KB
- Volume
- 25
- Category
- Article
- ISSN
- 0042-207X
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