✦ LIBER ✦
7664. The relation between lift-off of photoresist and the surface coverage of trimethylsiloxy groups on silicon wafers: a quantitative time-of-flight secondary ion mass spectroscopy and contact angle study: J J Ponjeé et al,J Vac Sci Technol, B8, 1990, 463–466
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 154 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
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