7598. The influence of the substrate temperature on the formation of buried epitaxial CoSi2 by ion implantation: K Radermacher et al,Vacuum,41, 1990, 1049–1051

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 154 KB
• Volume: 42
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(91)91666-c