7383. Optimization of primary beam conditions for secondary ion mass spectroscopy depth profiling of shallow junctions in silicon using a Cameca IMS-3f: J L Hunter et al, J Vac Sci Technol, A8, 1990, 2323–2328

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 153 KB
• Volume: 42
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(91)91190-y