7355. A model for simultaneous reactive sputtering, etching, and chemical vapor deposition: V A Koss and J L Vossen, J Vac Sci Technol, A8, 1990, 3791–3795

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 148 KB
• Volume: 42
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(91)91162-h