✦ LIBER ✦
7350. Plasma etching of III–V semiconductors in CH4/H2/Ar electron cyclotron resonance discharges: C Constantine et al, J Vac Sci Technol, B8, 1990, 596–606
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 150 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
No coin nor oath required. For personal study only.