✦ LIBER ✦
7319. formation of continous CoSi2 layers by high Co dose implantation into Si(100): R Hull et al, J Appl Phys, 68, 1990, 1629–1634
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 155 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
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