✦ LIBER ✦
7221. Removal of the process-induced fluorine associated to chemical vapor deposition of tungsten onto a polycrystallization silicon gate structure by heat treatment in a hydrogen-containing atmosphere: Th Eriksson et al,J Appl Phys, 68, 1990, 2112–2120
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 144 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
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