✦ LIBER ✦
5372. The effect of germanium ion implantation dose on the amorphization and recrystallization of polycrystalline silicon films: Y Komem and I W Hall, J Appl Phys, 52 (11), 1981, 6655–6658
- Publisher
- Elsevier Science
- Year
- 1982
- Tongue
- English
- Weight
- 153 KB
- Volume
- 32
- Category
- Article
- ISSN
- 0042-207X
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