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5369. A study of the strain in the damaged surface layer of V3Si after 2.0-MeV He-ion implantation: R J Schutz and L R Testardi, J Appl Phys, 52 (9), 1981, 5501–5509


Publisher
Elsevier Science
Year
1982
Tongue
English
Weight
147 KB
Volume
32
Category
Article
ISSN
0042-207X

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