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5354. The effect of thermal annealing on the grain size and electrical characteristics of arsenic ion-implanted and laser-irradiated polycrystaliine silicon films: Kenji Shihata and Shinji Onga, J Appl Phys 52 (9), 1981, 5566–5574


Publisher
Elsevier Science
Year
1982
Tongue
English
Weight
151 KB
Volume
32
Category
Article
ISSN
0042-207X

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