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50-nm Self-Aligned and “Standard” T-gate InP pHEMT Comparison: The Influence of Parasitics on Performance at the 50-nm Node

✍ Scribed by David A. J. Moran; Helen McLelland; Khaled Elgaid; Griogair Whyte; Colin R. Stanley; Iain Thayne


Book ID
114618524
Publisher
IEEE
Year
2006
Tongue
English
Weight
499 KB
Volume
53
Category
Article
ISSN
0018-9383

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