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3939. Electron trapping in SiO2 due to electron-beam deposition of aluminum. (USA)

Publisher
Elsevier Science
Year
1979
Tongue
English
Weight
138 KB
Volume
29
Category
Article
ISSN
0042-207X

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โœฆ Synopsis

and 0.43, respectively. The theory presented should hold over a much wider range of E/p than that for which experimental results are available.

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