✦ LIBER ✦
3653. Electron-beam-induced current and TEM studies of stacking faults formed by the oxidation of boron-implanted silicon: T E Seidel et al, J appl Phys, 48 (12), 1977, 5038–5042
- Book ID
- 103458760
- Publisher
- Elsevier Science
- Year
- 1978
- Tongue
- English
- Weight
- 138 KB
- Volume
- 28
- Category
- Article
- ISSN
- 0042-207X
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