2474. X-ray diffraction study of interdiffusion in bimetallic Ag/Cu thin films

• Publisher: Elsevier Science
• Year: 1977
• Tongue: English
• Weight: 260 KB
• Volume: 27
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(77)80823-3

✦ Synopsis

consists of a central initiation site caused during the high-voltage collapse and a surrounding dendritic etching caused after the voltage collapse. Energy dispersive analysis of the central region shows that when contaminants are observed they are dielectric. Dielectric particles above 10 , ~L diameter which are deliberately placed on the cathode cause breakdown during ion bombardment. These particles attain fields comparable to their dielectric strength (MV/cm) in ~s times from charging during ion bombardment (0.3 A/era'). The discharging of these particles is believed to initiate interclectrode breakdown.