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2113. The temperature dependence of the Hall effect in implanted layers prepared by bombardment of silicon with arsenic ions: R M Aranovich et al,Fiz Tekh Polup, 9 (2), 1975, 204–209 (in Russian)


Publisher
Elsevier Science
Year
1976
Tongue
English
Weight
144 KB
Volume
26
Category
Article
ISSN
0042-207X

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