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1/f Noise and trap density in n-channel strained-Si/SiGe modulation doped field effect transistors

✍ Scribed by Kristel Fobelets; Sergey L. Rumyantsev; Thomas Hackbarth; Michael S. Shur


Book ID
108271730
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
271 KB
Volume
53
Category
Article
ISSN
0038-1101

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