1452. Ion implantation—new technique for semiconductor doping: V V Rudnev et al, Elektron Tekh Materialy, 5, 1970, 148–149 (in Russian)

• Book ID: 103461458
• Publisher: Elsevier Science
• Year: 1971
• Tongue: English
• Weight: 149 KB
• Volume: 21
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(71)90266-1