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120-nm lithography using off-axis TIR holography and 364 nm exposure wavelength

✍ Scribed by M. Barge; S. Bruynooghe; F. Clube; A. Nobari; J.-L. Saussol; E. Grass; H. Mayer; B. Schnabel; E.-B. Kley


Book ID
114155246
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
462 KB
Volume
57-58
Category
Article
ISSN
0167-9317

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