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108. Detection of the sublimation end-point of a freeze-drying process by the dew-point method

✍ Scribed by *Guo-Yan Zhou; Wei-Yue Wang; Jin Zhang; Fei Xu; Baolin Liu; Bin-Hong Cao; Tse-Chao Hua


Book ID
116393262
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
42 KB
Volume
59
Category
Article
ISSN
0011-2240

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We studied the end point detection (EPD) for the direct CMP of the STI structure without the reverse moat etch process. In this case, we applied a high selectivity slurry (HSS) that improves the silicon oxide removal rate and maximizes the oxide-to-nitride selectivity. Quite acceptable and reproduci