100-kV advanced nanoelectron-beam exposure system for 8,12 ″ wafers and x-ray masks

✍ Scribed by Yukinori Ochiai; Takashi Ogura; Tohru Mogami

• Book ID: 104306556
• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 764 KB
• Volume: 46
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(99)00059-3