0.35 μm pattern fabrication using quartz-etch attenuate phase-shifting mask in an I-line stepper with a 0.50 NA and a 0.60 sigma

✍ Scribed by Wen-an Loong; Shyi-long Shy; Yung-chi Lin

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 788 KB
• Volume: 27
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(94)00106-5