✦ LIBER ✦
0.15 μm T-gate E-beam lithography using crosslinked P(MMA/MMA) developed in ortho-xylene resulting in high contrast and high plasma stability for dry etched recess gate pseudomorphic MODFETs for MMIC production
✍ Scribed by A. Hülsmann; E. Mühlfriedel; B. Raynor; K. Glorer; W. Bronner; K. Köhler; Jo. Schneider; J. Braunstein; M. Schlechtweg; P. Tasker; A. Thiede; T. Jakobus
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 418 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0167-9317
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