〈0001〉-oriented growth of AlN films on Si(111) by microwave plasma CVD with AlBr3NH3N2 system

✍ Scribed by Guangyao Meng; Xi Liu; Song Xie; Dingkun Peng

• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 479 KB
• Volume: 163
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/0022-0248(95)00966-3